섬유

low damage processing of semiconductor quantum structures

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 428
the fabrication of quantum-confined structures with critical dimensions of <100 nm places severe constraints on the processes used. high resolution techniques such as electron beam lithography are necessary, but not sufficient to guarantee high quality quantum structures. these structures are particularly sensitive to process-induced defects, and as well, to chemical modifications of their surfaces. this paper will describe low-damage processes and fabrication schemes appropriate for quantum structures. for example, the use of radical beam etching and strain confinement has provided quantum wires and dots with high luminescence efficiency. methods of surface modification and their effect on the optical properties of quantum structures will also be discussed
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