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- 시험분석
- 품질검사
- 제품안전·인증·검증
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제품안전(KC)
- 연구개발
- 기업지원
기술정보
섬유
compact ecr-source of ions and radicals for semiconductor surface treatment
- 출판일1999.03
- 저자
- 서지사항
- 등록일 2016.11.02
- 조회수 413
a compact microwave ecr-source of ions and free radicals has been fabricated. it includes a stainless steel tube, ceramic microwave input and permanent smco/sub 5/ ring-shaped magnets. its working pressure range is 10/sup -4/-10/sup -2/ torr using ar, h/sub 2/ n/sub 2/ and some other gases. the maximum ion current density in a hydrogen discharge at 10/sup -3/ torr reaches 3 ma cm/sup -2/ 15 cm downstream with a microwave power and plasma stream diameter of 100 w and 8 cm, respectively
