섬유

residual film detection using uv reflectance difference measurements

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 452
detection and removal of residual films is important throughout the semiconductor integrated circuit fabrication process however, at two steps in the production process, silicide formation and selective tungsten growth, removal of residual films is critical. failure to remove residuals prior to processing at these two steps will, at best, result in devices with degraded performance and, at worst, result in non-functional devices. a method for detecting residual films using ultraviolet (uv) reflectance measurements is described and experimental results are presented
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