섬유

diagnostic measurements in rf plasmas for materials processing

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 415
radio frequency (rf) plasmas are utilized in many applications in materials processing, such as semiconductor fabrication, surface modification, and coating. plasma processing has replaced older techniques, such as wet chemistry, because the latter could not provide the necessary characteristics as process demands increased a good example of this is the reduction of the feature size in semiconductors. the present critical dimension for semiconductor processing is 0.8 mu m and is anticipated to be
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