섬유

requirements of cam in ic technology

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 385
ultra clean technology (ultra clean processing environment, ultra clean wafer surface, perfect process-parameter control) is a crucial factor in developing high quality process technology for future ulsi fabrication. wafers should never be exposed to air. the possibility of performing all wafer processes in equipment having the same hardware configuration is discussed based on the concept of a closed manufacturing system in conjunction with highly advanced super clean systems
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