섬유

plasma processing equipment for minimum damage and chamber contamination

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 382
in a very low pressure ar discharge, the plasma potential dominates the ion impact energy under high frequency excitation. the authors' study found that the time-average plasma potential can be lowered below 'ground' level by applying dc biasing to the cathode shield. this minimizes contamination from sputtered material
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