섬유

laser cleaning of gaas surfaces in vacuo

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 362
it is shown that an atomically clean gaas surface can be prepared in vacuo by use of radiation pulses from a high power laser. for pulses of moderate energy density the surface remains structurally ordered so that this new cleaning technique may have a range of applications in surface physics. nevertheless, degradation of near-surface electrical properties can occur and this is sufficient to prevent the proper activation of photocathodes fabricated using the irradiated material
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