섬유

design criteria for ion implantation equipment for surface treatment

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 363
ion implantation has become widely used as a means of fabricating semiconductor devices, and sophisticated equipment has been developed for this purpose. some very different problems arise in the more novel application of ion implantation to the provision of resistance to wear or corrosion. examples of the industrial success of the process will be given, leading to a review of the requirements and design features of modern machines, work-chambers and ion sources. a dual process consisting of the deposition of a coating which is ion bombarded can bring about efficient intermixing by radiation-enhanced diffusion. this effect establishes new prospects for the production of surfaces that are tailored to meet arduous conditions
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