섬유

plasma etching of platinum film

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 313
studies of the relationship between etching rate and gas composition, finishing precision, etching mechanism, and the application of plasma etching to the forming of a ti-pt-au 3-layer electrode for use in high reliability semiconductor devices are reported. (era citation 03:018864)
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