섬유

compact ecr-source of ions and radicals for semiconductor surface treatment

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 290
a compact microwave ecr-source of ions and free radicals has been fabricated. it includes a stainless steel tube, ceramic microwave input and permanent smco//5 ring-shaped magnets. its working pressure range is 10** $minus$ **4-10** $minus$ **2 torr using ar, h//2, n//2 and some other gases. the maximum ion current density in a hydrogen discharge at 10** $minus$ **3 torr reaches 3 ma cm** $minus$ **2 15cm downstream with a microwave power and plasma stream diameter of 100 w and 8 cm, respectively. (author abstract) 7 refs
이전글 다음글 목록