섬유

chemically amplified negative resist system using acid-catalyzed etherification of carbinol

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 308
an acid-catalyzed etherification of carbinol has been used in the design of an alkali developable, highly sensitive negative resist. the resist consists of diphenylcarbinol (dpc), an acid generator, and a novolak resin shows the best lithographic performances in terms of the resist sensitivity and resolution among the resist using carbinol. in the exposed resist film, dpc undergoes bimolecular condensation during post exposure baking to form diphenylmethyl ether which has less polarity than dpc. therefore the solubility of the dpc resist in alkaline developers decreases upon exposure to deep-uv radiation and subsequent heating. as the bimolecular condensation proceeds catalytically, the resist exhibits high sensitivity. line and space patterns of 0.3 $mu$ m are obtained using the dpc resist in conjunction with a krf excimer laser stepper (author abstract) 6 refs
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