섬유

embossed gratings in sol-gel waveguides. pre-emboss heat treatment effects

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 302
an embossing technique is used to fabricate surface-relief gratings into sio//2-tio//2 dielectric, step-index, planar optical waveguides, fabricated using a sol-gel process. the influence that a pre-emboss bake cycle has upon the embossibility of the sio//2-tio//2 sol-gel films is described. through sem evaluation, the embossed grating ruling profile and general appearance are shown to be strongly dependent upon the duration of the bake at 70 $degree$ c. in addition, two embossing surface mechanisms, molding and stress-induced fracturing, are identified and correlated with the duration of the pre-emboss bake. embossed waveguide gratings with a 0.52 $mu$ m period and 100-200 nm peak-to-trough depth were fabricated. (author abstract) 16 refs
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