비의류제품

chemical modification for nanolithography using scanning tunneling microscopy

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 446
the key processes needed to push scanning tunneling microscopy (stm) nanolithography (surface modification by stm) into the realm of ordinary semiconductor processes (electron-beam and photolithography) are examined. complicated nanofeatures are successfully fabricated on an inorganic resist (ag-se film), implying the potential possibility of transcription of nanopatterns on a wide variety of substrates. the advantages and disadvantages of two tip-scanning modes (vector scan and raster scan) for writing complicated nanopatterns are described. a scanning tunneling spectroscopy (sts) study clarifies chemical composition of the fabricated nanostructures, which is important for precise pattern transcription
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