비의류제품

improved pattern fabrication of naphthoquinonediazide-based deep ultraviolet resist by alkaline surface treatment

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 453
this paper presents the high-aspect-ratio pattern fabrication method for krf excimer laser lithography. the alkaline surface treatment of a resist before exposure can enhance the contrast of a conventional naphthoquinone-diazide-based deep uv positive resist it has been found that the improvement depends upon the structure of the resist. high-aspect-ratio sub-half-micron patterns of the deep uv resist with an easy azo-coupling reaction were successfully attained using this simple method without compromising sensitivity
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