비의류제품

improving photolithographic processes with the chemical modification of si-sio/sub 2/ substrate surfaces

  • 출판일1999.03
  • 저자
  • 서지사항
  • 등록일 2016.11.02
  • 조회수 474
long-term stability of photoresist layers ensured with lower surface energy of the sio/sub x/ films is achieved with nonpolar groups leading to thermal resistance and hydrolysis immunity. as a result, the modified sio/sub x/ substrate exhibits significant changes in the contact angle obtained by tests with distilled water and other fluids. the modification provides an improved adherence of the resist to the substrate for fabrication of circuits and components
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